AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

AXXIS™— Facilitates multiple deposition techniques and co-deposited films efficiently!

The University of Alberta uses Lesker AXXIS for glancing angle depositions (GLAD).

Typical Applications

• R&D Thin Film Deposition

Deposition Techniques Available

• Magnetron Sputtering (RF, DC, or Pulsed DC)
• Electron Beam Evaporation
• Thermal Evaporation

Process Options

• Heating
• Cooling
• Bias
• Ion Source for Substrate Cleaning/Assisted Deposition

Features

• 18" diameter x 15" deep cylindrical 304 stainless steel chamber
• Six radial process ports
• Hinged front-loading door
• Door- or port-mounted substrate fixtures
• Turbo-molecular or cryogenic pumping
• Available with up to six TORUS^® circular magnetron sputtering sources
• Available with up to 6-pocket 5.5kW electron beam source
• Available with up to three thermal evaporation sources
• Optional ion source
• Open framework
• Instrument rack

Optional

• Substrate fixture indexing and rotation
• Load lock
• Computer-controlled process automation