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The Lesker Mass flow controllers for vapors, MKS 1150C and MKS 1152C, are well-suited for semiconductor applications.
The Lesker MKS Instruments' model 1150C is a mass flow controller for condensable vapors. Flow measurement uses the principle of choked-flow orifice with a constant upstream pressure. The orifice size is selected for a particular mass flow range. The absolute pressure upstream of the orifice is measured by a capacitance manometer, and controlled by feedback to a proportioning solenoid valve. The combination of choked orifice and constant upstream pressure gives highly precise flow control for vapors. The vapor source material can be either solid or liquid, providing its vapor pressure and evaporation rate are high enough (at a temperature below the controlled 150° C of model 1150C) to produce adequate flow through the orifice to meet the application's needs.