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TCVD-50B

TCVD-50B

1500(W) X 893(H) X 590(D)

The TCVD-50B is designed for researchers with limited budget, and is able to produce high quality graphene. It has a manual tabletop CVD system and a furnace moving system. The furnace is designed to move back and forth on dual tracks. Allowing fast-heating and fast-cooling for high quality synthesis. The TCVD-50B is extremely practical and reliability, as you are capable adding multiple options, adapting to the user’s requirements.

The World’s First Affordable 3D Profilometer: The Profilm3D

The World’s First Affordable 3D Profilometer: The Profilm3D

The Profilm3D® uses state-of-the-art white light interferometry (WLI) to measure surface profiles and roughness down to 0.05µm

TCVD-100A

TCVD-100A

1750(W) X 1585(H) X 750(D)

The TCVD-100A is Graphene Square’s best seller, sold the most by volume to universities and R&D firms. It is the most optimized for Graphene and CNT growth, with its technology well recognized. It has an optional automatic furnace moving system, the furnace is designed to move back and forth on a dual rail system. In addition, precision sensors allow automatic movement on level position. This allows fast-heating and fast-cooling. Its safety cabinet is a total enclosure for the system with an emergency shut-off button, protecting the user in dangerous situations. Furthermore, it is able to support growth of high-quality graphene as well as other 2D materials with safety features.

TCVD-D100CA

TCVD-D100CA

The TCVD-D100CA is optimized to produce TMDC materials such as h-BN, MoS2, WSe2. It has an automatic furnace moving system, designed to move back and forth on a dual rail system. In addition, precision sensors allow automatic movement on level position, this system allows fast-heating and fast-cooling. Its safety cabinet is a total enclosure for the system with an emergency shut-off button, protecting the user in dangerous situations. It also has a 12” Dual-core performance PC system, that you are able to control remotely. Furthermore, it is able to support growth of high-quality graphene as well as other 2D materials with safety features.

TCVD-RF100CA

TCVD-RF100CA

The TCVD-RF100CA has a plasma system, making low temperature growth and bulk processing possible. It has an automatic furnace moving system, designed to move back and forth on a dual rail system. In addition, precision sensors allow automatic movement on level position, this system allows fast-heating and fast-cooling. Its safety cabinet is a total enclosure for the system with an emergency shut-off button, protecting the user in dangerous situations. It also has a 12” Dual-core performance PC system, that you are able to control remotely. Furthermore, it is able to support growth of high-quality graphene as well as other 2D materials with safety features.

TCVD-DRF100CA

TCVD-DRF100CA

2300(W) x 1770(H) x 750(D)

The TCVD-DRF100CA has a Bi-level Dual CVD Chamber system with a unique design, capable of specialized and diverse research, with glove box included. The glove box makes it possible to handle unstable materials due to enclosure from indoor air. In addition, test samples are protected from oxidation and contamination. Its safety cabinet is a total enclosure for the system with an emergency shut-off button, protecting the user in dangerous situations. It also has a 12” Dual-core performance PC system, that you are able to control remotely.

Teflon® Housing

Substitute NPP with Teflon® for use with processes that require chemistry to be dispensed at elevated temperatures.

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