ALD-150LX

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Description

 

Kurt J. Lesker ALD Series— offers stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of Kurt J. Lesker ALD system platforms feature full process control, integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Features

  • Proprietary perpendicular flow reactant delivery for short cycle times and efficient reactant utilization
  • High throughput, centrally pumped for enhanced uniformity and reactant dispersion
  • Expandable LVP, HVP precursor delivery
  • Substrate heating - 500°C
  • Heated chamber walls, delivery lines and pumping lines
  • Fully enclosed framework and stand-alone electronics/control console
  • Scalable design allows for easy expansion
  • Global service and process support

Applications

  • University, industrial and government lab R&D
  • Semiconductor
  • Photovoltaics
  • OLED/organic electronics

Options

  • Substrate load lock
  • Remote plasma
  • In-situ real time film growth analysis and control
  • Glove boxes
  • Oil free pumping
  • Multi-technique tools

 

Lesker ALD-150LX - Atomic Layer Deposition System, Up to 6" Substrates

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