Chemical Vapor Deposition Systems (CVD)

Chemical Vapor Deposition Systems (CVD)

Chemical vapour deposition or CVD is a generic name for a group of processes that involve depositing a solid material from a gaseous phase.  Precursor gases (often diluted in carrier gases) are delivered into the reaction chamber at approximately ambient temperatures. As they pass over or come into contact with a heated substrate, they react or decompose forming a solid phase which and are deposited onto the substrate. The substrate temperature is critical and can influence what reactions will take place.

The Kurt J. Lesker Company CVD complex oxide deposition systems are designed for the unique challenges researches face throughout the materials development lifecycle. The Kurt J. Lesker Company CVD systems can be retrofitted with a variety of process options, enhancements, and precursor delivery systems.

 

Deposition Techniques

  • CVD
  • ALD gas delivery
  • Plasma-enhanced CVD (PECVD)
 

 

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Premier Solutions Pte Ltd / The Kurt J. Lesker Company – Chemical Vapor Deposition (CVD)

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