Metal Organic Chemical Vapor Deposition (MOCVD)

METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

MOCVD systems for substrates from 2-inch to 200 mm to fit requirements of R&D laboratories and small scale production. Utilization of state of the art Direct Liquid Injection (DLI) systems allows development of new materials with new chemical precursors.  Annealsys has the solution

 

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MTI - Tube Furnace

MTI - Tube Furnace

OTF-1600X-III- is a split-able three-zone tube furnace with Kanthal 1650°C grade SiC heating element,  82mm OD Alumina tube •...

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KDF - 900 Series (PVD)

KDF - 900 Series (PVD)

  The 900 Series features dual load lock, in-line, sputter down, batch systems configured with an optional high vacuum load lock and three or four target positions. •...

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