Etch and Deposition System

Etch and Deposition System

Etch and Deposition System

Plasma Etch - Plasma – Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion Etching (RIE), ICP – RIE System, ICP PECVD

An affordable plasma tool that can be used in research and process development or low volume production for precise etching and deposition on substrates up to 8" in diameter.

 

说明: http://www.syskey.com.tw/html/Products/ETCH%20System/products-ETCH-Plasma%20Etch_clip_image002.jpg 说明: Axic Iso-Lok 200® ICP Plasma System 说明: Axic BENCHMARK 800-III® ICP ETCH and DEPOSITION

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