Semi-Conductors

Semiconductors

Rapid Thermal Processing/Annealing (RTP/RTA)

Rapid Thermal Chemical Vapor Deposition (RTCVD)

Metal Organic Chemical Vapor Deposition (MOCVD)

Low Pressure Chemical Vapor Deposition (LPCVD) Furnaces

Physics Vapor Deposition systems (PVD_

Oven equipment

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Reactive Ion Etching (RIE)

ICP-RIE System, ICP PECVD

Chemical Vapor Deposition systems (CVD)

Atomic Layer Deposition systems (ALD)

Thin Film Measurement Tool

Film Stress Measurement tool 

Four Point Probe System 

DC/RF Magnetron Sputtering System

E-Beam and Thermal Evaporation system

Coater & Developer

and others….

Featured Products

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MTI - Tube Furnace

MTI - Tube Furnace

OTF-1600X-III- is a split-able three-zone tube furnace with Kanthal 1650°C grade SiC heating element,  82mm OD Alumina tube •...

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KDF - 900 Series (PVD)

KDF - 900 Series (PVD)

  The 900 Series features dual load lock, in-line, sputter down, batch systems configured with an optional high vacuum load lock and three or four target positions. •...

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