Rapid Thermal Processing/Annealing (RTP/RTA)

Rapid Thermal Chemical Vapor Deposition (RTCVD)

Metal Organic Chemical Vapor Deposition (MOCVD)

Low Pressure Chemical Vapor Deposition (LPCVD) Furnaces

Physics Vapor Deposition systems (PVD_

Oven equipment

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Reactive Ion Etching (RIE)


Chemical Vapor Deposition systems (CVD)

Atomic Layer Deposition systems (ALD)

Thin Film Measurement Tool

Film Stress Measurement tool 

Four Point Probe System 

DC/RF Magnetron Sputtering System

E-Beam and Thermal Evaporation system

Coater & Developer

and others….

Featured Products

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MTI - Tube Furnace

MTI - Tube Furnace

OTF-1600X-III- is a split-able three-zone tube furnace with Kanthal 1650°C grade SiC heating element,  82mm OD Alumina tube •...

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KDF - 900 Series (PVD)

KDF - 900 Series (PVD)

  The 900 Series features dual load lock, in-line, sputter down, batch systems configured with an optional high vacuum load lock and three or four target positions. •...

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