Production Magnetron Sputtering Sources

Our TORUS^® line of performance production magnetron sputter sources is a major breakthrough in the field of high-volume sputtering with target utilization up to 50%.

These sputter sources feature a unique combination of exceptional target life, high sputter rates, and increased power densities unmatched in the industry. The patented magnet designs trap electrons in inner, center, and outer erosion zones with precise magnetic field shapes to enable even erosion at maximum sputter target usage.

With circular production sources available from 6" to 12" diameter and linear sources available in lengths up to 140", KJLC® is positioned to offer the sputter solution for your production environment.

Utilization by Target Size

Our production cathodes optimize sputter target utilization for a wide range of target sizes, geometries, and materials. The values represented in the utilization table were from using aluminum targets eroded at 9kW and 10-3 Torr using argon.

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