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Annealsys - SprayCVD-050


2-inch SprayCVD furnace for laboratories.  Deposition and annealing in the same chamber







  • Spray Chemical Vapor Deposition (CVD) and Rapid Thermal Annealing (RTA) in the same furnace
  • Implantation annealing
  • Compound semiconductor annealing
  • Crystallization and Densification
  • Etc...




  • Two-inch rapid thermal processor for Spray Chemical Vapor Deposition (CVD) and annealing processes.
  • Dedicated to research applications.
  • Sample size : few square millimeters up to 2-inch diameter.
  • Quartz tube with stainless steel flanges process chamber.
  • Tubular infrared halogen lamps furnace.
  • Very fast ramp rates.
  • Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation.


Performance & characteristics


  • Temperature range: RT to 1200°C (± 1°C)
  • Fast ramp rate up to 250°C/s
  • Precursor mixing capability with Atokit Vaporizers
  • Vacuum range: Atm to 10-6 Torr
  • Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.
  • Optional pyrometer control.
  • The system is provided with full PC control with Windows compatible software.






Premier Solutions Pte Ltd / Annealsys - SprayCVD-050 (Spray Chemical Vapor Deposition (Spray CVD)


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