Silicon Dioxide (SiO2 (Fused Quartz)) Sputtering Targets

0.0/5 rating (0 votes)

Description

Premier Solutions Pte Ltd is distributing Kurt J Lesker Coporation (KJLC) comprehensive offering of sputtering targets, evaporation sources and other deposition materials which  is listed by material throughout the website. Technical specifications of Silicon Dioxide (SiO2 (Fused Quartz)) Sputtering Targets and ordering information is available.  Below you may find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact This email address is being protected from spambots. You need JavaScript enabled to view it. for current pricing or for a quote on sputtering targets and other deposition products not listed.

 

Specifications

Material Type Silicon (IV) Oxide   Theoretical Density (g/cc) 2.648
Symbol SiO2 Z Ratio **1.00
Color/Appearance White, Cyrstalline Solid Sputter RF
Melting Point (°C) 1,610 Max Power Density(Watts/Square Inch) 80
Type of Bond Indium

** The z-ratio is unknown. Therefore, we recommend using 1.00 or an experimentally determined value.

 

Ordering Table

Materials Size Purity Parts # Price
Silicon Dioxide 1.00" Dia. x 0.125" Thick 99.995% EJTSIO2451A2 P.O.R.
Silicon Dioxide 1.00" Dia. x 0.250" Thick 99.995% EJTSIO2451A4 P.O.R.
Silicon Dioxide 2.00" Dia. x 0.125" Thick 99.995% EJTSIO2452A2 P.O.R.
Silicon Dioxide 2.00" Dia. x 0.250" Thick 99.995% EJTSIO2452A4 P.O.R.
Silicon Dioxide 3.00" Dia. x 0.125" Thick 99.995% EJTSIO2453A2 P.O.R.
Silicon Dioxide 3.00" Dia. x 0.250" Thick 99.995% EJTSIO2453A4 P.O.R.
Silicon Dioxide 4.00" Dia. x 0.125" Thick 99.995% EJTSIO2454A2 P.O.R.
Silicon Dioxide 4.00" Dia. x 0.250" Thick 99.995% EJTSIO2454A4 P.O.R.
Silicon Dioxide 6.00" Dia. x 0.125" Thick 99.995% EJTSIO2456A2 P.O.R.
Silicon Dioxide 6.00" Dia. x 0.250" Thick 99.995% EJTSIO2456A4 P.O.R.
Silicon Dioxide 8.00" Dia. x 0.250" Thick 99.995% EJTSIO2458A4 P.O.R.

 

Bonded Assemblies Ordering Table

Material Size Purity Bonding Type Backing Plate Size Part # Price
Silicon Dioxide 1.00" Dia x 0.125" Thick 0.99995 Indium 1.00" Dia x 0.125" Thick EJUSIO2451A4 P.O.R.
Silicon Dioxide 2.00" Dia x 0.125" Thick 0.99995 Indium 2.00" Dia x 0.125" Thick EJUSIO2452A4 P.O.R.
Silicon Dioxide 3.00" Dia x 0.125" Thick 0.99995 Indium 3.00" Dia x 0.125" Thick EJUSIO2453A4 P.O.R.
Silicon Dioxide 4.00" Dia x 0.125" Thick 0.99995 Indium 4.00" Dia x 0.125" Thick EJUSIO2454A4 P.O.R.

 

 

Premier Solutions Pte Ltd - Silicon Dioxide (SiO2 (Fused Quartz)) Sputtering Targets - SiO2ST1

Share this product

Featured Products

  • 1
  • 2
Prev Next

MTI - Tube Furnace

MTI - Tube Furnace

OTF-1600X-III- is a split-able three-zone tube furnace with Kanthal 1650°C grade SiC heating element,  82mm OD Alumina tube •...

Read more

KDF - 900 Series (PVD)

KDF - 900 Series (PVD)

  The 900 Series features dual load lock, in-line, sputter down, batch systems configured with an optional high vacuum load lock and three or four target positions. •...

Read more

Copyright © 2012 - 2015 Premier Solutions Pte. Ltd. All Rights Resrved | Address: 100 Tras Street, 100 AM, #16-01, Singapore 079027. Tel: (65)62843818