NANO 36 - Entry to Mid-Level Deposition System

Overview

• Lesker most affordable deposition system platform, designed specifically with the entry to mid level user in mind.
• It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world
• The NANO 36 is designed to accommodate most evaporation processes, or it can be configured for magnetron sputtering applications
• The NANO 36 is highly capable, affordable, and has a compact form factor

Capabilities

• Thermal Evaporation: When equipped with Thermal Baseplate
• Magnetron Sputtering: When equipped with Torus Sputter sources

Features

• Adaptable chamber options
• Compact integrated design
• High speed diffusion pump(standard)
• Programmable Logic controller with touch screen interface
• Film thickness monitor, FTM-2400 or FTC-2800 controller

PLC control

• This affordable, full feature system offers reliable PLC control with a color touch screen interface
• Single button commands and manual operation are accessed from the touch screen
• This offers a simple and convenient user interface with the NANO 36 Deposition System

Multi-technique options

• 1"-4" Torus® circular magnetron sputtering sources

Film thickness control

• Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller
• The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processes

Thermal Evaporation Source

• The NANO 36 can be configured with four thermal evaporation sources on the base plate
• The evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination
• The sources also are stood off of the base plate of the chamber and are mounted on water cooled posts to limit excess heating of the chamber
• Thermal sources can be filament, basket heaters, box heaters, boats (coated and uncoated), rods, and screens
• Easy access to the boats and the mounting posts makes these sources very user friendly
• The Kurt J. Lesker Company is a global supplier of a larger range of deposition sources and deposition materials
• The user has control of the entire deposition system through the intuitive and easy to learn PLC

Options

• Dry Roughing Pump or 300 l/s Turbo Pump
• Substrate rotation
• Heating to either 150°C or 350°

Chamber Options

• Chamber choices are either a simple 12" x 18"Pyrex Glass Bell Jar or a 16"x16" Stainless Steel Box Chamber
• The box chamber door opens wide for easy chamber access
• Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutes

Flat plate substrate fixture

• Substrate options include primary rotation and heating up to 350°C with dual quartz lamp heaters
• The NANO 36 can accommodate up to an 8" diameter substrate mounting plate
• One single 8" wafer or multiple smaller wafers can be held in place
• The substrate plate can be easily removed or placed into the system with either a "lift up and out" hub mount or a twist-lock mounting

Lesker NANO 36 - Entry to Mid-Level Deposition System