MC 050

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Annealsys - MC050


Low cost 2-inch Metal Organic Chemical Vapor Deposition (MOCVD) system for R&D laboratory.  Deposition and annealing in the same chamber.







  • Metal and alloys, oxides, nitrides, III-V, II-VI,...
  • Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
  • Nitrides and alloys: GaN, AlN, GaAs, GaAsN...
  • High k Dielectrics: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
  • Ferroelectrics: SBT, SBTN, PLZT, PZT,…
  • Superconductors: YBCO, Bi-2223, Bi-2212, Tl-1223, …
  • Piezoelectrics: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
  • Metals: Pt, Cu,...
  • Colossal Magneto Resistance
  • Thermal coatings, Buffer layers, Mechanical coatings, Optics
  • Etc...




  • The Annealsys MC050 is a 2-inch Metal Organic Chemical Vapor Depositon (MOCVD) system especially developed to meet the requirements of research and development units.
  • The MC050 allows doing deposition of oxides, nitrides, metals, III-V and II-VI on various types of substrates by Metal Organic Chemical Vapor Depositon (MOCVD) using diluted solid and liquid organometallic precursors..
  • The MC050 system can be provided with direct injection vaporizers allowing the widest range of utilization of precursors for development of new materials. The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.


Performance & characteristics


  • Temperature range: RT to 1200°C
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-3 Torr
  • Glove box loading option
  • High vacuum capability in option






Premier Solutions Pte Ltd / Annealsys - MC050 (Metal Organic Chemical Vapor Deposition ( MOCVD ))


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