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Annealsys - AS-Master 


200mm Versatile Rapid Thermal Processing (RTP) system, Rapid Thermal Chemical Vapor Deposition (RTCVD) capability (option).  From RT to 1500down to 10-6 Torr.







  • Rapid Thermal Processing (RTP), Rapid Thermal Annealing (RTA), Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN)...
  • SiC contact annealing, Carbonization
  • Compound semiconductor annealing
  • Implant quality control
  • Rapid Thermal Chemical Vapor Deposition (RTCVD) (poly silicon, SiO2, SiNx,…)
  • Etc…




  • The AS-Master rapid thermal processor is a highly versatile tool allowing a wide range of processes from annealing to Rapid Thermal Chemical Vapor Deposition (RTCVD).
  • The high temperature version can run annealing processes up to 1500°C and allows new process development. Optional square chamber is available for large square or rectangular samples processing.
  • The cold wall chamber technology provides high process reproducibility under ultra clean and contamination-free environment.
  • Loadlock and cluster tool module versions are available for improved process environment cleanness.
  • The extended temperature range, the vacuum performance (atmosphere to 10-7 Torr) and gas mixing capability make AS-Master suitable for a large range of RTP and RTCVD processes.
  • Pyrometer and thermocouple temperature measurement associated with fast digital PID temperature controller provide high and stable temperature accuracy.
  • Manual loading and cassette to cassette versions make system suitable for process development and easy transfer to production.


Performance & characteristics


  • Temperature range: RT to 1500°C
  • Ramp rate up to 200°C/s
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-7 Torr






Premier Solutions Pte Ltd / Annealsys - As-Master (Rapid Thermal Processing (RTP), Rapid Thermal Annealing (RTA), Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN))


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