CVD System Platforms

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Kurt J. Lesker CVD complex oxide deposition systems are designed for the unique challenges researches face throughout the materials development lifecycle.  Kurt J. Lesker CVD systems can be retrofitted with a variety of process options, enhancements, and precursor delivery systems.


Typical Applications

  • Complex oxide thin film materials research and pilot production
  • Ultra-thin film depositions

Deposition Techniques

  • CVD
  • ALD gas delivery
  • Plasma-enhanced CVD (PECVD)

Common Features & Options

  • Cylindrical 316L cold wall reaction chamber
  • High speed rotating disc reactors enhance depositions
  • Accommodates substrates up to 200mm
  • Radially-partitioned gas induction system features showerhead design for uniform gas flow
  • Advanced pumping manifold design enhances gas flow
  • Reactant delivery system (RDS) with flash evaporation chamber (see below for more information)
  • Fully automated computer process control
  • Full enclosure cabinet design

Process Options & Enhancements

  • Substrate heating and rotation
  • Inert gas glovebox
  • Robotic buffer and transfer chamber
  • Reactant, vapor, liquid, and solid precursor delivery
  • Atomic layer deposition (ALD) gas module
  • Plasma enhancement module with RF controller
  • In-situ and inline process monitoring
  • In-situ and inline metrology


Lesker CVD System Platforms

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