Circular HV Sources

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Description

 

 

KJLC offers a comprehensive line of circular TORUS magnetron sputter sources suited for most R & D applications. These sputter cathodes range in size from one to four inches in diameter, are functional with virtually any material, have exceptional target utilization, and can be driven by RF, DC, or Pulsed-DC power supplies.

Engineered for Optimum Performance:

  • Wide pressure range operation to 10-9 Torr
  • Low outgassing
  • Excellent thin film uniformity and deposition rates
  • Efficient sputter target utilization
  • Superior target hold down mechanism eliminates the need for thermal pastes, keepers, etc.
  • Compact, modular magnet array
  • Magnets NOT exposed to vacuum
  • Magnets NOT exposed to cooling water
  • Cooling water is not exposed to vacuum chamber during target change
  • Unbalanced operation and compatibility with magnetic materials is available (please contact us at This email address is being protected from spambots. You need JavaScript enabled to view it. for more information)
  • Full line of accessories available (gas injection, chimneys, shutters, cluster arrays, etc.)

Custom sputter source configurations available

   

 

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