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Annealsys - AS-One


Rapid Thermal Processing (RTP) Cold Wall Chamber Furnaces for 100mm and 150mm Version







  • Rapid Thermal Annealing (RTA)
  • Rapid thermal oxidation (RTO)
  • Diffusion, contact annealing
  • Compound semiconductor  annealing
  • Nitridation, Silicidation, Selenization, Sulfurization
  • Crystallization and Densification




  • 4-inch and 6-inch wafer capability
  • Floor standing system for reduced footprint
  • High reliability and low cost of ownership
  • Stainless steel cold wall chamber technology:
  • High process reproducibility
  • Ultra clean and contamination-free environment.
  • High cooling rates and low memory effect
  • A high vacuum version (10-6 mbar) is available
  • Pyrometer and thermocouple control
  • Fast digital PID temperature controller
  • Edge pyrometer viewport insures enhanced temperature control of the susceptor for compound, semiconductors and small samples.


Performance & characteristics


  • Temperature range: RT to 1500°C
  • Ramp rate up to 200°C/s
  • Cooling rate up to 100°C/s with special equipment
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-6 Torr






Premier Solutions Pte Ltd / Annealsys - AS-One (Rapid Thermal Processing (RTP), Rapid Thermal Annealing (RTA), Rapid Thermal Oxidation (RTO) 


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