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Annealsys - AS-Micro


3-inch Rapid Thermal Processing (RTP) system for laboratories.  Dual chamber version for cross contamination issues







  • Rapid Thermal Annealing (RTA)
  • Implantation annealing
  • Compound semiconductor annealing
  • Crystallization and Densification
  • Selezination and Sulfurization
  • Etc...




  • Three-inch rapid thermal processor
  • Compact table top configuration
  • Dedicated to research applications
  • Sample size: few square millimeters up to 3-inch diameter
  • Optional 3-inch susceptor for 2-inch sample
  • Quartz tube with stainless steel flanges process chamber
  • Tubular infrared halogen lamps furnace
  • Very fast ramp rates
  • Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation.


Performance & characteristics


  • Temperature range: RT to 1250°C
  • Ramp rate up to 250°C/s on 2-inch diameter silicon substrate, 200°C/s on 3-inch
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atm to 10-2 Torr (10-6 Torr with optional turbo pump)
  • Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.
  • Optional pyrometer control.
  • The system is provided with full PC control with Windows compatible software.






Premier Solutions Pte Ltd / Annealsys - AS-Micro (Rapid Thermal Annealing (RTA))


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