MC 100

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Annealsys - MC100


Low cost 2-inch Metal Organic Chemical Vapor Deposition (MOCVD) system for R&D laboratory.  Deposition and annealing in the same chamber.







  • Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
  • High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)- Ferroelectric: SBT, SBTN, PLZT, PZT
  • Superconductor: YBCO, Bi-2223, Bi-2212, Tl-- 1223, ...
  • Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead - Titanate
  • Metals : Pt, Cu, ...
  • Colossal Magneto Resistance
  • Thermal coatings
  • Buffer layers
  • Mechanical coatings
  • Optics
  • Etc...




  • The Annealsys MC100 is a cold wall Metal Organic Chemical Vapor Deposition (MOCVD) reactor especially developed to meet the requirements of research and development units.
  • The MC100 allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAO,…) by Metal Organic Chemical Vapor Deposition (MOCVD) using a wide range of solid and liquid organometallic volatile precursors using Direct Liquid Injection technology.
  • The MC100 system can be provided with various vaporization systems and vacuum equipment depending on the application.
  • Pulse pressure Chemical Vapor Deposition (CVD) capability


Performance & characteristics


  • Temperature range: RT to 800°C
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-3 Torr
  • High vacuum optional






Premier Solutions Pte Ltd / Annealsys - MC100 (Metal Organic Chemical Vapor Deposition ( MOCVD ))


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