LC 100

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Annealsys - LC100


4-inch Low Pressure Chemical Vapor Deposition (LPCVD) furnace for small production.  Single or dual tube furnaces are available.







  • Stress free silicon rich nitride
  • Low Pressure Chemical Vapor Deposition (LPCVD)
  • Annealing
  • Oxidation
  • Etc...




  • The LC100 is a four-inch tubular furnace for annealing and Low Pressure Chemical Vapor Deposition (LPCVD) processes. It is dedicated to small-scale production and research applications. It can process up to 50 wafers per process.
  • The process chamber is made of a quartz tube with stainless steel flanges. The quartz boats are held by two quartz rods attached to the loading door. The high quality, low thermal mass, heater elements provide fast thermal response and low contamination.
  • A high quality digital temperature controller controls the temperature of each heating zone.
  • The controller has auto-tuning capability and continuous parameter adaptation in case of process changes. This temperature control system provides highly accurate and reproducible thermal cycles.
  • The system is provided with one purge gas line and can receive up to 8 process gas lines with mass flow controllers.
  • System can be customized upon customer request for special applications.


Performance & characteristics


  • Temperature range: 500 to 1000°C (1150°C optional)
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-6 Torr



Premier Solutions Pte Ltd / Annealsys LC-100 (Low Pressure Chemical Vapor Deposition (LPCVD))


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