ALD Reactant Chamber Design

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The Kurt J. Lesker Company®’s ALD reactant chamber is designed for maximum process flexibility while optimizing cycle time. The sample is loaded through a rectangular port in the chamber (either manually or utilizing the optional load lock) and positioned in the reactant chamber where deposition occurs. Up to four precursor or gas inputs can be introduced through the top plate. A fifth input is available through the plasma port.


  • 304L stainless steel construction
  • Front loading port
  • Back side substrate heating to 500°C
  • Substrates sized from small irregular pieces up to 150mm wafers
  • Angled analytical ports for in-situ analysis
  • Top-mounted vapor delivery (perpendicular flow)
  • Curtain gas flow design to speed cycle time and minimize reactor wall contamination/parasitic CVD
  • Patent Pending Precursor Focusing TechnologyTM (PFTTM)


  • Vacuum load lock
  • Remote plasma source
  • In-situ ellipsometry package
  • RGA system


Process Control Software Overview

The Kurt J. Lesker Company®’s intuitive software is SEMI E95 compliant and features a wide range of process feedback information and user-input control.


Lesker ALD Reactant Chamber Design

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